Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Reexamination Certificate
2007-08-07
2007-08-07
Chu, John S. (Department: 1752)
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
C430S281100, C430S287100, C430S288100, C430S302000
Reexamination Certificate
active
10101695
ABSTRACT:
A negative-type image recording material comprising a support having a rear surface and an image recording layer disposed on the support, the image recording layer having a front surface and including (A) a radical-generating agent and (B) a radically polymerizable compound, wherein a static friction coefficient between the front surface and the rear surface is less than 0.50. In order to achieve such a specified static friction coefficient, it is preferable that the image recording layer contains (D) a compound represented by the following formula (1):in-line-formulae description="In-line Formulae" end="lead"?R1—X (1)in-line-formulae description="In-line Formulae" end="tail"?wherein R1represents an optionally substituted hydrocarbon group having a total of 8 to 32 carbon atoms, and X represents CO—Y—R2, NH—CO—NH—R2, SO2—Y—R2, or Y—R3in which Y represents O, S, NR4or a single bond.
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English Abstract of JP 2000-267292A published Sep. 29, 2000.
Aoshima Keitaro
Kikuchi Kei
Buchanan & Ingersoll & Rooney PC
Chu John S.
Fujifilm Corporation
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