Image analysis – Applications – Manufacturing or product inspection
Reexamination Certificate
2006-07-13
2010-11-09
Le, Vu (Department: 2624)
Image analysis
Applications
Manufacturing or product inspection
C382S199000
Reexamination Certificate
active
07831083
ABSTRACT:
A method for monitoring the stability of an inspection or processing of a substrate, a substrate inspection system and a processor readable medium are disclosed. One or more images of one or more portions of the substrate may be obtained from an inspection tool. Image quality information may be extracted from the one or more images. The image quality information may be analyzed to monitor stability of the inspection tool and/or to determine variation of a process performed on the substrate.
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Isenberg Joshua D.
JDI Patent
KLA-Tencor Technologies Corporation
Le Vu
Liew Alex
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