Image quality monitoring for substrate inspection

Details Image quality monitoring for substrate inspection Image quality monitoring for substrate inspection

2006-07-13

2010-11-09

Le, Vu (Department: 2624)

Image analysis

Applications

Manufacturing or product inspection

C382S199000

Reexamination Certificate

active

07831083

ABSTRACT:
A method for monitoring the stability of an inspection or processing of a substrate, a substrate inspection system and a processor readable medium are disclosed. One or more images of one or more portions of the substrate may be obtained from an inspection tool. Image quality information may be extracted from the one or more images. The image quality information may be analyzed to monitor stability of the inspection tool and/or to determine variation of a process performed on the substrate.

REFERENCES:
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patent: 6252981 (2001-06-01), Guest et al.
patent: 6990219 (2006-01-01), Morimura et al.
patent: 2002/0009220 (2002-01-01), Tanaka
patent: 2004/0008903 (2004-01-01), Kim
patent: 2005/0213842 (2005-09-01), Aldrich et al.

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