Image projection method and semiconductor device manufacturing m

Details Image projection method and semiconductor device manufacturing m Image projection method and semiconductor device manufacturing m

1995-06-07

1997-03-04

Dzierzynski, Paul M.

Optical: systems and elements

Diffraction

359562, 355 53, G02B 518, G02B 2746, G03B 2742

Patent

active

056085753

ABSTRACT:
An edge emphasis type phase shift reticle is illuminated obliquely, and zeroth order diffraction light and first order diffraction light caused by a fine pattern of the reticle and having substantially the same intensity are incident and distributed on a pupil of a projection optical system, symmetrically with respect to a predetermined axis, whereby the fine pattern is imaged with use of the zeroth order diffraction light and first order diffraction light.

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Fukuda, et al., Nikkei Microdevices, pp. 108 through 114, Jul. 1990.

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