Optical: systems and elements – Diffraction
Patent
1994-01-03
1994-11-22
Sikes, William L.
Optical: systems and elements
Diffraction
359738, 359894, 355 53, 355 71, G02B 2700, G02B 2742, G03B 2772, C03F 720
Patent
active
053674049
ABSTRACT:
An image projection apparatus and method is disclosed wherein a stop having a rectangular opening is disposed in an illumination optical system and, through the function of this stop, a rectangular effective light source is defined on a pupil of a projection optical system. With light from this effective light source, longitudinal and transverse patterns of a reticle extending substantially along the configuration of the effective light source are illuminated. Zeroth order and first order diffraction light caused by these patterns is incident and distributed on the pupil so as to define thereon a rectangular configuration about the center of the pupil, and the longitudinal and transverse patterns are imaged with the diffraction light.
REFERENCES:
patent: 4589769 (1986-05-01), Matsuki
patent: 5059013 (1991-10-01), Jain
Patent Abstracts of Japan, Kokai No. 56-045023, vol. 5, No. 103, Jul. 1981.
Kamon, et al., "Photolithography System Using Annular Illumination," Japanese Journal of Applied Physics, vol. 30, No. 11B, Nov. 1991, pp. 3021 through 3029.
Canon Kabushiki Kaisha
Parsons David R.
Sikes William L.
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