Image projection method and device manufacturing method using th

Details Image projection method and device manufacturing method using th Image projection method and device manufacturing method using th

1993-10-04

1995-10-17

Rosasco, S.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

430296, 430311, 359485, 359489, G03F 900

Patent

active

054590000

ABSTRACT:
An image of a fine pattern having light-projecting portions and non-light-projecting portions is formed by illuminating the fine pattern. Upon illumination of the fine pattern, light beams are projected from respective light-projecting portions of the pattern onto an image-forming surface to form an image. Coherency of light beams from respective adjacent light-projecting portions is reduced to provide an image of the fine pattern having high contrast.

REFERENCES:
patent: 3917399 (1975-11-01), Buzawa et al.
patent: 4947413 (1990-08-01), Jewell et al.
patent: 5048926 (1991-09-01), Tanimoto
patent: 5153773 (1992-10-01), Muraki et al.
patent: 5245470 (1993-09-01), Keum
patent: 5316879 (1994-05-01), Berger et al.
Matsumoto, et al., "Issues and Method of Designing Lenses for Optical Lithography," Optical Engineering, vol. 31, No. 12, Dec. 1992, pp. 2657 through 2664.

Affiliated with

Also associated with

Rating

Image projection method and device manufacturing method using th does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Image projection method and device manufacturing method using th, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Image projection method and device manufacturing method using th will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-596324