Image analysis – Pattern recognition – Feature extraction
Reexamination Certificate
2006-05-16
2006-05-16
Wu, Jingge (Department: 2623)
Image analysis
Pattern recognition
Feature extraction
Reexamination Certificate
active
07046849
ABSTRACT:
The invention provides image layout evaluation method to optimize the layout of an image. The invention can include a laid-out-image input device for inputting laid-out combined images, an induction-field-in-vision calculation device for calculating the induction field in vision of the laid-out combined images that are input to the image-laid-out input device and obtaining an equipotential line from the calculated induction field in vision, and a layout-evaluation device for evaluating the layout quality based on the equipotential line obtained by the induction-field-in-vision calculation. The layout-evaluations device can further include a complexity calculation device, and thereby, calculates the complexity of the equipotential line obtained by the induction-field-in-vision calculation device, evaluates the layout quality based on the complexity, and determines which layout is most suitable.
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Kuhn Jordan
Oliff & Berridg,e PLC
Seiko Epson Corporation
Wu Jingge
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