Image intensifier and electron multiplier therefor

Electric lamp and discharge devices – Photosensitive – Secondary emitter type

Reexamination Certificate

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C313S528000, C313S1030CM, C313S1050CM

Reexamination Certificate

active

06836059

ABSTRACT:

FIELD OF THE INVENTION
The present invention relates to image intensifiers and, more particularly, to electron multipliers used therein.
BACKGROUND OF THE INVENTION
Image intensifiers are used in night/low light vision applications to amplify ambient light into a useful image.
FIG. 1
depicts a known image intensifier tube
100
. In the illustrated image intensifier tube
100
, photons impinge upon a photo-cathode
102
, thereby generating electron/hole pairs. A microchannel plate (MCP)
104
is positioned to receive the electrons generated by the photo cathode
102
. The MCP
104
generates an increased number of electrons for each electron received from the photo-cathode
102
. A phosphor screen
106
is positioned to receive the increased number of electrons and produce an image for display by the image intensifier tube
100
. The photo-cathode
102
, MCP
104
, and phosphor screen
106
are supported by a vacuum housing
108
that maintains gaps between these devices under vacuum to facilitate the flow of electrons therebetween.
Electron-bombarded devices (EBD) are capable of multiplying electrons.
FIG. 2
depicts an EBD
200
, which is based on a semiconductor structure having an input surface
202
and an emission surface
204
opposite the input surface
202
. Accelerated electrons
206
impinge on the input surface
202
to produce an increased number of free electrons
208
within the semiconductor structure. The increased number of electrons
208
traverse the semiconductor structure between the input surface and the emission surface where they are emitted. Additional information regarding EBDs can be found in Reflection and Transmission Secondary Emission from Silicon by R. U. Martinelli (Appl. Phys. Lett., Vol. 17, Num. 6, pp. 313-314, 1970) and in Reflection and Transmission Secondary Emission from GaAs by R. U. Martinelli et al. (J. Appl. Phys., Vol. 43, Num. 11, pp. 4803-4804, 1972).
Because EBDs
200
are semiconductor structures, they can be inexpensively produced using mature, proven semiconductor fabrication technology and have low power requirements. However, EBDs typically have poor image transfer characteristics when used for electron multiplication.
Accordingly, an inexpensive, low power electron multiplier having improved image transfer capability is needed for use in devices such as image intensifiers. The present invention fulfills this need among others.
SUMMARY
The present invention provides an image intensifier and an electron multiplication method and apparatus therefor. The method in accordance with the present invention includes creating an increased number of electrons within a semiconductor device having an input surface and an emission surface opposite the input surface and directing the increased number of electrons to an emission area for emission from the emission surface. The apparatus in accordance with the present invention includes a semiconductor structure having an input surface for receiving electrons and an emission surface opposite the input surface, the semiconductor structure generating an increased number of electrons responsive to the received electrons. The semiconductor structure is doped to direct the increased number of electrons to at least one emission area on the emission surface, each of the at least one emission areas associated with a corresponding region of the input surface.


REFERENCES:
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patent: 5029963 (1991-07-01), Naselli et al.
patent: 5084780 (1992-01-01), Phillips
T. Guo et al.; “Negative electron affinity (Si-Na2KSb-Cs)-O-Cs photocathode”, J. Appl. Phys. Lett. 58 (16), Apr. 22, 1991, pp. 1757-1758.
G. Di Cola et al.; “Numerical Calculations of the Yeild and Fano Factor According to van Roosbroeck's Statistical Model for Semiconductors”, Physical Review, vol. 162, No. 3, Oct. 13, 1967; pp. 690-692.
T. Guo; “Negative electron affinity silicon heterojunction photocathodes with alkali antimonide intermediate layers”, J. Appl. Phys. 72 (9), Nov. 1, 1992; pp. 4384-4389.
T. Guo; “Photoelectron emission and avalanche electron emission from shallow Si p-n juncitons”, J. Appl. Phys. 72 (7), Oct. 1, 1992; pp. 3058-3063.
W. van Roosebroeck; “Theory of the Yield and Fano Factor of Electron-Hole Pairs Generated in Semiconductor by High-Energy Particles”; Physical Review, vol. 139, No. 5A; Aug. 30, 1965; pp. 1702-1716.

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