Radiation imagery chemistry: process – composition – or product th – Radiation sensitive product – Two or more radiation-sensitive layers containing other than...
Patent
1993-01-15
1995-01-10
Bowers, Jr., Charles L.
Radiation imagery chemistry: process, composition, or product th
Radiation sensitive product
Two or more radiation-sensitive layers containing other than...
430544, 430957, 430379, G03C 146
Patent
active
053806336
ABSTRACT:
An improved color reversal element is disclosed capable of development in black and white developer, and of development in a color developer comprising:
REFERENCES:
patent: 4258127 (1981-03-01), Ishibashi et al.
patent: 4461826 (1984-07-01), Yamashita et al.
patent: 4480028 (1984-10-01), Kato et al.
patent: 4482629 (1984-11-01), Nakagawa et al.
patent: 4618571 (1986-10-01), Ichijima et al.
patent: 4675274 (1987-06-01), Ueda et al.
patent: 4684604 (1987-08-01), Harder
patent: 4717648 (1988-01-01), Ueda et al.
patent: 4729943 (1988-03-01), Pfaff et al.
patent: 4740454 (1988-04-01), Deguchi et al.
patent: 4791049 (1988-12-01), Kojima et al.
patent: 4798784 (1989-01-01), Kishimoto et al.
patent: 4937179 (1990-06-01), Hirano et al.
patent: 4962018 (1990-10-01), Szajewski et al.
patent: 5004677 (1991-04-01), Ueda
patent: 5041367 (1991-08-01), Sniadoch
patent: 5051345 (1991-09-01), Haraga et al.
patent: 5187056 (1993-02-01), Saito et al.
Research Disclosure, 15854, vol. 158, Jun. 1977, pp. 35-38.
Baloga John D.
Harder John W.
Bowers Jr. Charles L.
Eastman Kodak Company
Letscher Geraldine
Stewart Gordon M.
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