Image forming state adjusting system, exposure method and...

Photocopying – Projection printing and copying cameras – Distortion introducing or rectifying

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C355S077000

Reexamination Certificate

active

11736177

ABSTRACT:
A second communications server obtains adjustment information of an adjustment unit in an exposure apparatus and information related to image forming quality (such as wavefront aberration) of a projection optical system under an exposure condition that serves as a reference, via a first communications server, and then calculates an optimal adjustment amount of the adjustment unit under a target exposure condition based on the information. In addition, the second communications server obtains adjustment information of the adjustment and actual measurement data of image forming quality of the projection optical system via the first communications server, and then calculates the optimal adjustment amount of the adjustment unit under the target exposure condition based on the information. And, the second communications server controls the adjustment unit in the exposure apparatus via the first communications server, based on the calculations results.

REFERENCES:
patent: 4786166 (1988-11-01), Kroko
patent: 4920505 (1990-04-01), Suzuki
patent: 5321493 (1994-06-01), Kamon
patent: 5420436 (1995-05-01), Seya et al.
patent: 5424552 (1995-06-01), Tsuji et al.
patent: 5754299 (1998-05-01), Sugaya et al.
patent: 5807647 (1998-09-01), Hashimoto
patent: 5898501 (1999-04-01), Suzuki et al.
patent: 5978085 (1999-11-01), Smith et al.
patent: 6078554 (2000-06-01), Ootaki et al.
patent: 6100978 (2000-08-01), Naulleau et al.
patent: 6118535 (2000-09-01), Goldberg et al.
patent: 6245470 (2001-06-01), Kamon
patent: 6248486 (2001-06-01), Dirksen et al.
patent: 6268903 (2001-07-01), Chiba et al.
patent: 6329112 (2001-12-01), Fukuda et al.
patent: 6459480 (2002-10-01), Kye
patent: 6570143 (2003-05-01), Neil et al.
patent: 6646729 (2003-11-01), Van Der Laan et al.
patent: 6961115 (2005-11-01), Hamatani et al.
patent: 7088426 (2006-08-01), Hirukawa et al.
patent: 7102731 (2006-09-01), Hirukawa et al.
patent: 2002/0001071 (2002-01-01), Nomura et al.
patent: 2002/0008869 (2002-01-01), Van Der Laan et al.
patent: 2002/0036758 (2002-03-01), Maria de Mol et al.
patent: 2002/0191165 (2002-12-01), Baselmans et al.
patent: 2004/0059444 (2004-03-01), Tsukakoshi
patent: 198 20 785 (1999-10-01), None
patent: 0 267 721 (1988-05-01), None
patent: 0 338 200 (1989-10-01), None
patent: 1 079 223 (2001-02-01), None
patent: 1 128 217 (2001-08-01), None
patent: 1 160 626 (2001-12-01), None
patent: 1 355 140 (2003-10-01), None
patent: 1 359 608 (2003-11-01), None
patent: 5-296879 (1993-11-01), None
patent: 6-235619 (1994-08-01), None
patent: 10-154657 (1998-06-01), None
patent: 11-118613 (1999-04-01), None
patent: 11-176744 (1999-07-01), None
patent: 11-233424 (1999-08-01), None
patent: 2000-47103 (2000-02-01), None
patent: 2000-121491 (2000-04-01), None
patent: 2000-146757 (2000-05-01), None
patent: 2000-266640 (2000-09-01), None
patent: 2000-331923 (2000-11-01), None
patent: 2001-230193 (2001-08-01), None
patent: 2002-324752 (2002-11-01), None
patent: WO99/60361 (1999-11-01), None
patent: WO 00/31592 (2000-06-01), None
patent: WO 00/55890 (2000-09-01), None
patent: WO00/55890 (2000-09-01), None
patent: WO 02/50506 (2002-06-01), None
Patent Abstracts of Japan, JP 2001-289735, Oct. 19, 2001.
Donis G. Flagello, et al., “The influence of lens aberrations in lithography”, Microlithography world, 1998, pp. 11-20.
Kenneth A. Goldberg, et al., “High-Accuracy Interferometry of Extreme Ultraviolet Lithographic Optical Systems”, J. Vac. Sci. Technol., vol. 16, No. 6, XP-000931349, Nov./Dec. 1998, pp. 3435-3439.
Donis G. Flagello, et al., “Towards a Comprehensive Control of Full-Field Image Quality in Optical Photolithography”, SPIE Microlithography Seminar, Mar. 1997, pp. 1-14.
Marco Moers, et al. “Application of the Aberration Ring Test (Artemis) to Determine Lens Quality and Predict Its Lithographic Performance”, Proceedings of SPIE vol. 4346, Feb. 27-Mar. 2, 2001, pp. 1379-1387, XP008025416.
U.S. Appl. No. 11/736,134, filed Apr. 17, 2007, Shimizu, et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Image forming state adjusting system, exposure method and... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Image forming state adjusting system, exposure method and..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Image forming state adjusting system, exposure method and... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3933486

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.