Image-forming process

Radiation imagery chemistry: process – composition – or product th – Imaged product – Structurally defined

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

427 96, 118125, G03F 700

Patent

active

057502919

ABSTRACT:
A process for the formation of a patterned resist of a photocurable material on a circuit board, the uncured portion of which is water soluble. The process includes the steps of forming a layer of an aqueous emulsion of a photocurable material upon the circuit board, drying the layer to a substantially dry and non-tacky state, imagewise exposing the layer to radiation to cure portions of the layer exposed to the radiation, and removing unexposed portions of the layer by washing with water. In a preferred embodiment, the photocurable material is an organic solvent solution of an epoxy acrylate derived from an epoxy novolac resin which has been carboxylated to render it alkali-developable.

REFERENCES:
patent: 4154614 (1979-05-01), Tsunoda
patent: 4592816 (1986-06-01), Emmons
patent: 5093223 (1992-03-01), Iwasawa

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Image-forming process does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Image-forming process, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Image-forming process will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-977914

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.