Image forming method used in liquid crystal display device...

Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Screen other than for cathode-ray tube

Reexamination Certificate

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C430S273100, C430S325000, C349S106000, C349S156000

Reexamination Certificate

active

10448035

ABSTRACT:
The present invention provides an image forming method comprising the steps (1) to (5): (1) forming a first negative photosensitive resin layer on a substrate; (2) forming a barrier layer on the first negative photosensitive resin layer; (3) forming a second negative photosensitive resin layer on the barrier layer; (4) exposing the substrate, on which the first and second negative photosensitive resin layers are formed, to light via a photo mask having at least two types of light transmissible patterns; and (5) developing the exposed first and second negative photosensitive resin layers, wherein a photosensitivity ratio of the first negative photosensitive resin layer to the second negative photosensitive resin layer (the first/the second) is more than 1. The invention also provides a color filter, a spacer for a liquid crystal display device, and a projection for orientation control, each of which is formed by the method.

REFERENCES:
patent: 4835086 (1989-05-01), Jain
patent: 5409800 (1995-04-01), Sato et al.
patent: 6162589 (2000-12-01), Chen et al.
patent: 2001/0026347 (2001-10-01), Sawasaki et al.
patent: 2003/0162107 (2003-08-01), Sato
patent: 59-175725 (1984-10-01), None
patent: 04-301846 (1992-10-01), None
patent: 07-135170 (1995-05-01), None
“Notice of Reasons for Rejection” from JP 2002-049546, Jul. 2005, with English language translation.

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