Image-forming member for electrophotography comprising hydrogena

Details Image-forming member for electrophotography comprising hydrogena Image-forming member for electrophotography comprising hydrogena

1979-05-04

1984-09-11

Schilling, Richard L.

Radiation imagery chemistry: process, composition, or product th

Electric or magnetic imagery, e.g., xerography,...

Radiation-sensitive composition or product

430 66, 430 67, 430 84, 430 95, 430 96, 430135, 430136, 2525011, 252502, 428446, G03G 504, H01L 1300, B32B 904

Patent

active

044710429

ABSTRACT:
An image-forming member for electrophotography has a photoconductive layer comprising a hydrogenated amorphous semiconductor composed of silicon and/or germanium as a matrix and at least one chemical modifier such as carbon, nitrogen and oxygen contained in the matrix.

REFERENCES:
patent: 3607388 (1971-09-01), Hori et al.
patent: 4147667 (1979-04-01), Chevallier et al.
patent: 4217374 (1980-08-01), Ovshinsky et al.
patent: 4225222 (1980-09-01), Kempter
patent: 4226898 (1980-10-01), Ovshinsky et al.
patent: 4265991 (1981-05-01), Hirai et al.
Moustakas et al., "Preparation of . . . Silicon by rf Sputtering", Solid State Communications, vol. 23, 1977, pp. 155-158.
Thompson et al., "R.F. Sputtering Amorphous Silicon Solar Cells", Proc. Int'l Photovoltaic Solar Energy Conf., 9/1977, Reidel Pub. Co.
44PCT Int'l Publication No. WO/79/00724, dated Oct. 4, 1979, to Ovshinsky et al., filed Mar. 8, 1978 as Ser. No. 884,664 in U.S.A.

Affiliated with

Also associated with

Rating

Image-forming member for electrophotography comprising hydrogena does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Image-forming member for electrophotography comprising hydrogena, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Image-forming member for electrophotography comprising hydrogena will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1194957