Image formation on heat-developable light-sensitive material...

Incremental printing of symbolic information – Light or beam marking apparatus or processes – Scan of light

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C430S350000, C430S353000

Reexamination Certificate

active

06930698

ABSTRACT:
An image forming method comprising exposing a heat-developable light-sensitive material comprising a support having thereon at least a light-sensitive silver halide having a silver iodide content of 5 to 100 mol %, a light-insensitive organic silver salt, a heat developing agent, and a binder by means of a scanning optical system having a light source emitting a laser beam having an emission peak between 350 nm and 450 nm to form a latent image on said heat-developable light-sensitive material, heating said heat-developable light-sensitive material to about 80 to 250° C. in a heat development section, and cooling said heat-developable light-sensitive material having been heat treated in said heat development section to or below a development stopping temperature while said heat-developable light-sensitive material is transported in a cooling section.

REFERENCES:
patent: 3781902 (1973-12-01), Shem et al.
patent: 6143488 (2000-11-01), Uytterhoeven et al.
patent: 6288370 (2001-09-01), Ogawa et al.
patent: 6309114 (2001-10-01), Torisawa et al.
patent: 6320642 (2001-11-01), Ogawa et al.
patent: 6335153 (2002-01-01), Toya
patent: 2002/0039708 (2002-04-01), Katoh et al.
patent: 0 851 284 (1998-07-01), None
patent: 0 922 995 (1999-06-01), None
patent: 11-133572 (1991-05-01), None
patent: 5-224347 (1993-09-01), None
patent: 2000-305213 (2000-11-01), None
patent: 2000-321743 (2000-11-01), None
patent: 2000-321744 (2000-11-01), None
XP-002219658, Fuji Photo Film, Nov. 2, 2000 ‘Abstract’.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Image formation on heat-developable light-sensitive material... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Image formation on heat-developable light-sensitive material..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Image formation on heat-developable light-sensitive material... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3493121

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.