Image formation method using beam exposure

Details Image formation method using beam exposure Image formation method using beam exposure

1995-12-27

1997-10-14

Goodrow, John

Radiation imagery chemistry: process, composition, or product th

Electric or magnetic imagery, e.g., xerography,...

Radiation-sensitive composition or product

430127, 430945, G03G 510

Patent

active

056770987

ABSTRACT:
A method for forming an image using beam exposure of an electrophotosensitive material comprising an electrically conductive support having thereon an electrophotosensitive layer containing an inorganic photoconductor, a chemical sensitizer, a spectral sensitizing dye and a binder resin, wherein the spectral sensitizing dye is at least one dye selected from the compounds represented by formulae (I) and (II) defined in the disclosure and the surface of the electrically conductive support on the side of the electrophotosensitive layer has a BEKK smoothness of 300 sec/10 cc or more.

REFERENCES:
patent: 4857431 (1989-08-01), Kato et al.
patent: 4929527 (1990-05-01), Kato et al.
patent: 5089367 (1992-02-01), Murasawa et al.

Affiliated with

Also associated with

Rating

Image formation method using beam exposure does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Image formation method using beam exposure, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Image formation method using beam exposure will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1553885