Radiation imagery chemistry: process – composition – or product th – Stripping process or element – Forming nonplanar image
Patent
1996-03-15
1996-11-26
Chu, John S. Y.
Radiation imagery chemistry: process, composition, or product th
Stripping process or element
Forming nonplanar image
430 7, 430260, 430262, 430263, G03C 1112
Patent
active
055784135
ABSTRACT:
A photosensitive transfer material is disclosed including a temporary substrate having provided thereon an alkali-soluble thermoplastic resin layer, an intermediate layer, and a photosensitive resin layer in this order, the transfer material having an interlaminar adhesion which is lowest between the thermoplastic resin layer and the temporary substrate, wherein the alkali-soluble thermoplastic resin layer contains (A) an alkali-soluble thermoplastic resin having a weight average molecular weight of from 50,000 to 500,000 and a glass transition temperature of from 0.degree. to 140.degree. C. and (B) an alkali-soluble thermoplastic resin layer having a weight average molecular weight of from 3,000 to 30,000 and a glass transition temperature of from 30.degree. to 170.degree. C. at an (A)/(B) weight ratio of from 5/95 to 95/5. The transfer material can be transferred to a permanent substrate at a high speed without entrapping air bubbles due to unevenness on the permanent substrate. The temporary substrate can easily be stripped off after transfer. Exposure in air is possible. The thermoplastic resin layer is rapidly removed with an alkali aqueous solution.
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Fujikura Sadao
Wada Minoru
Chu John S. Y.
Fuji Photo Film Co. , Ltd.
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