Image focus monitor for alternating phase shift masks

Details Image focus monitor for alternating phase shift masks Image focus monitor for alternating phase shift masks

2006-04-25

2006-04-25

Huff, Mark F. (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

C355S061000, C216S012000, C356S624000, C356S401000

Reexamination Certificate

active

07033708

ABSTRACT:
A focus monitor on an alternating phase shift mask may include sub-wavelength features which have a depth corresponding to an etch depth of primary features on the mask (e.g., a 180° etch depth), but which produce an effective phase shift of about 60° to 120°.

REFERENCES:
patent: 5300786 (1994-04-01), Brunner et al.
patent: 6440616 (2002-08-01), Izuha et al.
patent: 2004/0029023 (2004-02-01), Misaka
Levinson, Harry J., Principles of Lithography, 2001, SPIE—The International Society of Optical Engineering, p. 274, formula 8.18.

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