Image exposure device and laser exposure device applied thereto

Details Image exposure device and laser exposure device applied thereto Image exposure device and laser exposure device applied thereto

2007-06-05

2007-06-05

Dang, Hung (Department: 2873)

Optical: systems and elements

Glare or unwanted light reduction

C359S566000, C359S738000, C372S050110, C372S102000

Reexamination Certificate

active

11142254

ABSTRACT:
When a ratio R between a total angle φ of a widening angle in a median intensity of light of a light source (a GaN based semiconductor laser) and a total angle 2/φ of a widening angle of light defining a numerical aperture NA of a collimator optical system (collimator lens) is defined as R=(sin−1NA)×2/φ, the numerical aperture of the collimator optical system (collimator lens) is set so that 2.0≧R≧0.58. Thus, an image exposure device is provided that can suppress stray light of a light source that emits a large amount of stray light.

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Matsushita, Optronics, (2000) No. 1, p. 62.

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