Image enhancement for multiple exposure beams

Details Image enhancement for multiple exposure beams Image enhancement for multiple exposure beams

2007-10-23

2007-10-23

Young, Christopher G. (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Including control feature responsive to a test or measurement

C430S296000, C430S311000, C430S942000, C430S945000

Reexamination Certificate

active

10778668

ABSTRACT:
An aspect of the present invention includes a method for patterning a workpiece covered at least partly with a layer sensitive to electromagnetic radiation by using a plurality of exposure beams having a predetermined separation in at least a first direction for exposing a pattern onto said workpiece, where said predetermined separation is fixed to an initial system pitch in said first direction, comprising the actions of: scaling a pattern pitch in said first direction to be an integer multiple of said system pitch, adjusting the initial system pitch in said first direction to be an adjusted system pitch to maintain a scale of said pattern, adjusting said predetermined separation of exposure beams to said adjusted system pitch. Other aspects of the present invention are reflected in the detailed description, figures and claims.

REFERENCES:
patent: 5635976 (1997-06-01), Thuren et al.
patent: 6368756 (2002-04-01), Yamada et al.
patent: 2003/0096175 (2003-05-01), Higashi
Pearce-Percy et al., “Dynamic Corrections in MEBES 4500.” J. Vac. Sci. Technol. B 12(6), Nov./Dec. 1994, p. 3393-3398.

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