Illuminator for a photolithography device

Details Illuminator for a photolithography device Illuminator for a photolithography device

2011-07-19

2011-07-19

Glick, Edward J (Department: 2882)

Photocopying

Projection printing and copying cameras

Illumination systems or details

Reexamination Certificate

active

07982855

ABSTRACT:
The invention relates to an illuminator for a photolithography device. The invention comprises: a source (1′) of a light beam (10) which is used to illuminate a mask (8) and to expose an area of a wafer (W); at least one main array (4) of microlenses; and a shutter (6) consisting of at least one shutter plate (61) comprising at least one part (612) that is opaque to the light beam (10) and a plurality of parts (610) that are transparent to the beam, whereby said plate (61) can be moved in relation to the beam (10) along a direction of movement (X) that is essentially parallel to the plate, such that the opaque part (612) can at least partially block the light beam or such that the transparent parts can at least partially enable the passage of the light beam (10). The invention is characterized in that it comprises movement means (9) which can move the shutter (6) in synchronism with the movements of the mask (8) and the wafer (W), said shutter (6) being located in an area (11) close to a pupil (40, 410) of an optical system comprising at least the main array (4) of microlenses. The invention also relates to a photolithography device comprising one such illuminator.

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patent: 62-47124 (1987-02-01), None
patent: 01-175730 (1989-07-01), None
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English Translation of JP 62-047124, published Feb. 28, 1987.
French Preliminary Search Report for French Application No. FR 0509036, dated Jun. 12, 2006 (2 pages) (in French language).

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