Illumination system or projection lens of a...

Photocopying – Projection printing and copying cameras – Illumination systems or details

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C355S071000

Reexamination Certificate

active

08031326

ABSTRACT:
In some embodiments, the disclosure provides an optical system, in particular an illumination system or a projection lens of a microlithographic exposure system, having an optical system axis and at least one element group including three birefringent elements each of which includes optically uniaxial material and having an aspheric surface, wherein a first birefringent element of the group has a first orientation of its optical crystal axis, a second birefringent element of the group has a second orientation of its optical crystal axis, wherein the second orientation can be described as emerging from a rotation of the first orientation, the rotation not corresponding to a rotation around the optical system axis by an angle of 90° or an integer multiple thereof, and a third birefringent element of the group has a third orientation of its optical crystal axis, wherein the third orientation can be described as emerging from a rotation of the second orientation, the rotation not corresponding to a rotation around the optical system axis by an angle of 90° or an integer multiple thereof.

REFERENCES:
patent: 6191880 (2001-02-01), Schuster
patent: 6252712 (2001-06-01), Furter et al.
patent: 6970232 (2005-11-01), McGuire, Jr.
patent: 2003/0086156 (2003-05-01), McGuire
patent: 2003/0137733 (2003-07-01), Gerhard et al.
patent: 2004/0105170 (2004-06-01), Krahmer et al.
patent: 2004/0179272 (2004-09-01), Gerhard et al.
patent: 2004/0263814 (2004-12-01), Unno
patent: 2005/0146798 (2005-07-01), Kraehmer et al.
patent: 2006/0056064 (2006-03-01), Shafer
patent: 2007/0183017 (2007-08-01), Hembd
patent: 1 355 180 (2003-10-01), None
patent: 1 681 710 (2006-07-01), None
patent: 05 045519 (1993-02-01), None
patent: WO 02/093209 (2002-11-01), None
patent: WO 2005/001527 (2005-01-01), None
patent: WO 2005/059645 (2005-06-01), None
Office action in Chinese Application No. 2006800339207 (Chinese counterpart to U.S. Appl. No. 12/042,621), dated May 2, 2010.
J. Burnett et al., “High-index materials for 193nm immersion lithography,” Proceedings of the SPIE, Bellingham, VA, vol. 5754, Mar. 1, 2005; pp. 611-621.
Hecht, Optics, Pearson Education Inc. , Fourth Edition, 342, 2002.
Office Action in Chinese Application No. 2006800339207 (Chinese counterpart to U.S. Appl. No. 12/042,621), and English translation thereof, dated Sep. 30, 2010.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Illumination system or projection lens of a... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Illumination system or projection lens of a..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Illumination system or projection lens of a... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-4282561

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.