Illumination system of a microlithographic projection...

Details Illumination system of a microlithographic projection... Illumination system of a microlithographic projection...

2008-08-13

2011-12-20

Nguyen, Hung Henry (Department: 2882)

Photocopying

Projection printing and copying cameras

Illumination systems or details

Reexamination Certificate

active

08081293

ABSTRACT:
The disclosure provides an illumination system of a microlithographic projection exposure apparatus, as well as related methods and components. In some embodiments, the illumination system includes an optical element configured so that, when a linearly polarized entry beam which has an angle spectrum is incident on the first optical element, a maximum aperture angle of the entry beam at the first optical element is not more than 35 mrad. A component, which is rotationally symmetric about an optical axis of the system, of a birefringence present in the illumination system can be at least partially compensated by the first optical element.

REFERENCES:
patent: 2002/0027719 (2002-03-01), Kreuzer
patent: 2003/0128349 (2003-07-01), Unno
patent: 2003/0168597 (2003-09-01), Webb et al.
patent: 2004/0150877 (2004-08-01), Hogele et al.
patent: 2005/0146798 (2005-07-01), Kraehmer et al.
patent: 103 02 765 (2004-07-01), None
patent: WO 03/040785 (2003-05-01), None
patent: WO 2005/054954 (2005-06-01), None
patent: WO 2005/069081 (2005-07-01), None
Translation of the International Preliminary Report on Patentability, for the corresponding PCT Application No. PCT/EP2007/051179, dated Oct. 23, 2008.

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