Illumination system of a microlithographic projection...

Photocopying – Projection printing and copying cameras – Illumination systems or details

Reexamination Certificate

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Details

C355S071000

Reexamination Certificate

active

08031327

ABSTRACT:
The disclosure relates an illumination system that has an optical axis and a polarization-influencing arrangement. The arrangement can include a first wedge plate with a first wedge direction which extends perpendicularly to the optical axis in the direction of a maximum change in thickness of the first wedge plate, and a second wedge plate with a second wedge direction which extends perpendicularly to the optical axis in the direction of a maximum change in thickness of the second wedge plate. The first wedge plate and the second wedge plate can be arranged rotatably about the optical axis. The first wedge plate and the second wedge plate can be respectively made from birefringent crystal material having a respective optical crystal axis. In a starting position of the arrangement in which the first wedge direction and the second wedge direction extend in mutually parallel relationship, the optical crystal axis of the first wedge plate and the optical crystal axis of the second wedge plate can be oriented at an angle of 45°±3° relative to each other. One of the two crystal axes can be oriented perpendicularly or parallel to the preferred polarization direction of the light impinging on the arrangement.

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patent: WO 2007/031544 (2007-03-01), None

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