Illumination system of a microlithographic projection...

Photocopying – Projection printing and copying cameras – Illumination systems or details

Reexamination Certificate

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Details

C355S071000

Reexamination Certificate

active

08040492

ABSTRACT:
An illumination system of a microlithographic projection exposure apparatus, as well as related systems, methods and components are disclosed. The illumination system can include a polarization manipulator configured to variably adjust a change in the polarization state of light impinging thereon. The illumination system can also include a mirror arrangement having a plurality of mirror elements that are displaceable independently of each other to alter an angle distribution of the light reflected by the mirror arrangement. A change in the intensity distribution caused by the polarization manipulator in a plane of the projection exposure apparatus can be at least partially compensated by the mirror arrangement.

REFERENCES:
patent: 6958806 (2005-10-01), Mulder et al.
patent: 2001/0052968 (2001-12-01), Shiozawa
patent: 2006/0055834 (2006-03-01), Tanitsu et al.
patent: 2006/0077373 (2006-04-01), Mulkens et al.
patent: 2007/0146676 (2007-06-01), Tanitsu et al.
patent: 2007/0165202 (2007-07-01), Koehler et al.
patent: 2008/0218725 (2008-09-01), Fiolka
patent: 2009/0135397 (2009-05-01), Fiolka
patent: 103 43 333 (2005-04-01), None
patent: 10 2007 055 408 (2008-05-01), None
patent: WO 2005/026843 (2005-03-01), None
patent: WO 2005/069081 (2005-07-01), None
patent: WO 2007/039519 (2007-04-01), None

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