Illumination system for microlithography

Details Illumination system for microlithography Illumination system for microlithography

2011-03-22

2011-03-22

Kim, Peter B (Department: 2882)

Photocopying

Projection printing and copying cameras

Illumination systems or details

Reexamination Certificate

active

07911584

ABSTRACT:
The present invention relates to an illumination system for microlithography, especially for wavelengths ≦193 nm, especially preferably for EUV lithography for illuminating a field in a field plane with at least one optical integrator which splits up a light bundle emitted by a light source into a plurality of light channels each having a light intensity,characterized in thata filter is provided in the light path from the light source to the field plane, with the filter comprising filter elements which are configured in such a way that the light intensity of at least one light channel is reduced in the light path after the filter element.

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