Illumination source and method for microlithography

Photocopying – Projection printing and copying cameras – Illumination systems or details

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

355 53, 359327, G03B 2742, G03B 2754

Patent

active

054538149

ABSTRACT:
A light source having a solid state laser emitting a beam that is separated into a number of segments. Each segment is frequency shifted by a different amount so that the segments do not substantially overlap in the frequency domain. Each segment passes through a short focal length lens element of a fly's eye array to be dispersed onto a mask plane for evenly illuminating a mask. The lens elements of the fly's eye array are contained within a small region in comparison to the width of the dispersed beam segments, such that each beam segment contributes illumination to the entirety of a common portion of the mask. The apparatus may include a beam expander to permit the frequency shifting cells to be positioned in an array entirely circumscribed by the diameter of the expanded beam, or may alternatively include an arrangement of beam splitters used to generate a branching beam path, with the branches passing through different numbers of frequency shifting cells to generate a diversity of frequencies in the resulting beam segments. A half- or quarter-wave plate may be used to shift or change the polarity of some of the beam segments, or of portions of all of the beam segments, reducing the quantity or capacity of frequency shifting cells required.

REFERENCES:
patent: 4939630 (1990-07-01), Kikuchi et al.
patent: 4991160 (1991-02-01), Premji
patent: 5048926 (1991-09-01), Tanimoto
patent: 5091744 (1992-02-01), Omata
patent: 5105076 (1992-04-01), Premji
patent: 5224200 (1993-06-01), Rasmussen et al.
patent: 5233460 (1993-08-01), Partlo et al.
patent: 5237367 (1993-08-01), Kudo
patent: 5245384 (1993-09-01), Mori
patent: 5274494 (1993-12-01), Rafanelli et al.
patent: 5296892 (1994-03-01), Mori
patent: 5300971 (1994-04-01), Kudo
patent: 5309198 (1994-05-01), Nakagawa
patent: 5333035 (1994-07-01), Shiraishi
patent: 5363170 (1994-11-01), Muraki
patent: 5392094 (1995-02-01), Kudo
Turunen et al., Coherence Control by acousto-optic multifrequency Bragg Diffraction, abstract, SPIE vol. 1230 Int'l. Conf. on Optoelectronic Sci. & Eng. '90, p. 8.
Vasilev et al., Reduction of contrast of speckle structure . . . , abstract, Opt. Spectrosc. (USSR) 70(1), Jan. 1991, p. 2.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Illumination source and method for microlithography does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Illumination source and method for microlithography, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Illumination source and method for microlithography will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1554761

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.