Photocopying – Projection printing and copying cameras – Illumination systems or details
Reexamination Certificate
2011-06-28
2011-06-28
Kim, Peter B (Department: 2882)
Photocopying
Projection printing and copying cameras
Illumination systems or details
C355S052000, C355S053000, C355S071000
Reexamination Certificate
active
07969556
ABSTRACT:
An illumination optical system for microlithography is used to guide an illumination light bundle from a radiation source to an object field in an object plane. A field facet mirror has a plurality of field facets to predetermine defined illumination conditions in the object field. A following optical system is arranged downstream of the field facet mirror to transfer the illumination light into the object field. The following optical system has a pupil facet mirror with a plurality of pupil facets. Some of the field facets are divided into individual mirrors, which predetermine individual mirror illumination channels. The latter illuminate object field portions, which are smaller than the object field. At least some of the individual mirrors are configured as individual correction mirrors. The latter can be tilted between at least two tilting positions, a central region illumination taking place in a basic tilting position and a surrounding region illumination of the object field taking place in a correction tilting position. An illumination optical system is the result, with which a correction of undesired variations of illumination parameters, in particular an illumination intensity distribution over the object field, is possible without loss of light.
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Office Action corresponding to German Application No. 10 2009 045 694.5, dated Jul. 23, 2010, with English translation (4 pages).
Carl Zeiss SMT GmbH
Fish & Richardson P.C.
Kim Peter B
Riddle Christina
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