Illumination optical system, alignment apparatus, and projection

Details Illumination optical system, alignment apparatus, and projection Illumination optical system, alignment apparatus, and projection

1995-05-22

1996-09-03

Gonzalez, Frank

Optics: measuring and testing

By alignment in lateral direction

With registration indicia

250548, G01B 1100

Patent

active

055528929

ABSTRACT:
An illumination optical system and an alignment apparatus suitable for reticle alignment in the projection exposure apparatus. There is provided an illumination optical system having parallel beam supply means for supplying a parallel beam and a light guide for guiding the parallel beam from the parallel beam supply means to a target illumination object, comprising diffusion means, arranged between the parallel beam supply means and the light guide, for diffusing the parallel beam, wherein an incident end face of the light guide is arranged to be inclined by a predetermined angle with respect to a plane perpendicular to a direction of incidence of the parallel beam onto the diffusion means.

REFERENCES:
patent: 2983193 (1961-05-01), Schade
patent: 4402596 (1983-09-01), Kanatani
patent: 4870452 (1989-09-01), Tanimoto et al.
patent: 4938598 (1990-07-01), Akiyama et al.
patent: 5150173 (1992-09-01), Isobe et al.
Nikon Industrial Microscopes published on Jan. 1, 1991 by Nikon.
Metaphot-66/Optiphot-66 published on Oct. 17, 1984 by Nikon.

Affiliated with

Also associated with

Rating

Illumination optical system, alignment apparatus, and projection does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Illumination optical system, alignment apparatus, and projection, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Illumination optical system, alignment apparatus, and projection will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1954857