Illumination optical system, alignment apparatus, and projection

Illumination – Light source and modifier – Plural serial lens elements or components

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Details

362 32, 362259, 362339, F21V 1312

Patent

active

057976740

ABSTRACT:
An illumination optical system and an alignment apparatus suitable for reticle alignment in the projection exposure apparatus. There is provided an illumination optical system having parallel beam supply means For supplying a parallel beam and a light guide for guiding the parallel beam from the parallel beam supply means to a target illumination object, comprising diffusion means, arranged between the parallel beam supply means and the light guide for diffusing the parallel beam, wherein an incident end face of the light guide is arranged to be inclined by a predetermined angle with respect to a plane perpendicular to a direction of incidence of the parallel beam onto the diffusion means.

REFERENCES:
patent: 5610763 (1997-03-01), Kudo

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