Illumination modification scheme synthesis using lens characteri

Photocopying – Projection printing and copying cameras – Methods

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355 71, 359432, G03B 2732

Patent

active

061151084

ABSTRACT:
A method (400) of determining a custom illumination scheme for a projection-type photolithography system (500) is disclosed. The custom illumination scheme provides compensation for imaging system aberrations within the photolithography system (500) and thereby reduces critical dimension non-uniformities of features produced by the photolithography system (500) across a substrate (120). The method (400) includes the steps of performing a lithography simulation (404) for one or more nominal features using imaging system aberration data which characterizes the photolithography system (500) and an initial illumination scheme. The lithography simulation includes one or more simulated features which differ from the one or more nominal features due to the imaging system aberration data. The method (400) further includes determining whether the difference between the one or more nominal features and the one or more simulated features is less than an acceptable threshold (408) and varying the illumination scheme (412) to thereby form a modified illumination scheme if the difference is not less than the acceptable threshold. Another lithography simulation is then performed (404) for the one or more nominal features using the imaging system aberration data and the modified illumination scheme, and the above steps are repeated until the difference is less than the acceptable threshold (410).

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