Illumination apparatus for exposure

Details Illumination apparatus for exposure Illumination apparatus for exposure

1987-10-28

1989-04-04

Hix, L. T.

Photocopying

Projection printing and copying cameras

Step and repeat

355 67, 355 69, G03B 2742, G03B 2772

Patent

active

048190330

ABSTRACT:
An illumination apparatus is disclosed which is suitable for use in a projection/exposure system for projecting an image of a circuit pattern of a reticle on a semiconductor wafer through a projection lens. The illumination apparatus includes an excimer laser for emitting a pulsed laser beam, an optical system for illuminating the reticle with a plurality of laser pulses emitted from the excimer laser so that laser pulses having passed through the reticle impinge on the semiconductor wafer in different directions through the projection lens, and a light intensity control device for controlling the light intensity of each of the laser pulses so that the laser pulses equally contribute to the reaction of a light sensitive material which is provided on the semiconductor wafer, with light.

REFERENCES:
patent: 4619508 (1982-10-01), Shibuya et al.
patent: 4624551 (1986-11-01), Anzai et al.
SPIE-vol. 174, Development in Semiconductor Microlithography IV, 1979, pp. 28-35.

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