Illumination aperture of low intensity loss

Photocopying – Projection printing and copying cameras – Illumination systems or details

Patent

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Details

355 53, 355 71, 362296, F21V 700, G03B 2742, G03B 2754

Patent

active

057150400

ABSTRACT:
In a photolithography system, an illumination assembly to provide intensified uniform illumination includes an illumination source reflector and a plate having an aperture opening therethrough and a mirrored surface thereon, the mirrored surface of the plate confronting the illumination source reflector. The illumination assembly further includes an illumination source for generating illumination disposed between the illumination source reflector and the plate.

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