Illuminating optical system for use in projecting exposure devic

Details Illuminating optical system for use in projecting exposure devic Illuminating optical system for use in projecting exposure devic

1997-07-24

2000-08-01

Quach, Y.

Illumination

Light source and modifier

Including translucent or transparent modifier

362268, F21V 500

Patent

active

060956674

ABSTRACT:
An illuminating optical system for use in a projection exposure device with high utilization efficiency of the light from the light source and capable of easily realizing with simple construction is disclosed. The system comprises a light source, a light flux separating optical system for separating a light flux from the light source, a condenser optical system for leading the light flux separated by the light flux separating optical system on a reticle, and a diffraction optical unit included in the light flux separating optical system and having a linear grating pattern for separating the light flux from the light source into four.

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patent: 5245384 (1993-09-01), Mori
patent: 5695274 (1997-12-01), Kamihara et al.

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