Illuminance measuring method, an exposure apparatus using the me

Details Illuminance measuring method, an exposure apparatus using the me Illuminance measuring method, an exposure apparatus using the me

1997-03-26

1999-05-18

Hantis, K P

Optics: measuring and testing

Lamp beam direction or pattern

G01J1/00

Patent

active

059055693

ABSTRACT:
An illuminance measuring method and apparatus measures the illuminance on a wafer in an exposure apparatus for projecting a pattern formed on a mask onto a wafer. The illuminance of the mask causes the formation of ghost light on the mask. The apparatus and method use a first technique to measure the illuminance on the wafer while a mask used for actual exposure is mounted in the exposure apparatus and the mask is illuminated. The apparatus and method also use a second technique, different form the first technique, to measure the illuminance on the wafer while the mask used for actual exposure is mounted in the exposure apparatus and the mask is illuminated. The apparatus and method also find the distribution of the ghost light caused by the mask, based on the illuminance measured by these two techniques.

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