Active solid-state devices (e.g. – transistors – solid-state diode – Thin active physical layer which is – Low workfunction layer for electron emission
Reexamination Certificate
2006-06-06
2006-06-06
Blum, David S. (Department: 2813)
Active solid-state devices (e.g., transistors, solid-state diode
Thin active physical layer which is
Low workfunction layer for electron emission
Reexamination Certificate
active
07057204
ABSTRACT:
A III–V group nitride system semiconductor substrate has III–V group nitride system single crystal grown on a hetero-substrate. The III–V group nitride system semiconductor substrate has a flat surface and satisfies the relationship of θ>α, where θ [deg ] is given as an average in angles of the substrate surface to low index surfaces closest to the substrate surface measured at a plurality of arbitrary points in plane of the substrate, and a variation range of the measured angles to θ is represented by ±α [deg ].
REFERENCES:
patent: 5290393 (1994-03-01), Nakamura
patent: 6348096 (2002-02-01), Sunakawa et al.
patent: 6413627 (2002-07-01), Motoki et al.
patent: 6555845 (2003-04-01), Sunakawa et al.
patent: 2002/0028564 (2002-03-01), Motoki et al.
patent: 2002/0066403 (2002-06-01), Sunakawa et al.
patent: 2002/0197825 (2002-12-01), Usui et al.
patent: 2003/0080345 (2003-05-01), Motoki et al.
patent: 4-297023 (1992-10-01), None
patent: 10-312971 (1998-11-01), None
patent: 11-251253 (1999-09-01), None
patent: 2000-22212 (2000-01-01), None
patent: 2003-165799 (2003-06-01), None
patent: 2003-178984 (2003-06-01), None
O. Nam et al., “Lateral epitaxy of low defect density GaN layers via organometallic vapor phase epitaxy”, Applied Physics Letters, vol. 71, No. 18, Nov. 3, 1997, pp. 2638-2640.
M. Kuramoto et al., “Room-Temperature Continuous-Wave Operation of InGaN Multi-Quantum-Well Laser Diodes Grown on an n-GaN Substrate with a Backside n-Contact”, Jpn. J. Appl. Phys., vol. 38, Part 2, No. 2B, Feb. 15, 1999, pp. L184-L186.
Y. Oshima et al., “Preparation of Freestanding GaN Wafers by Hydride Vapor Phase Epitaxy with Void-Assisted Separation”, Jpn. J. Appl. Phys., vol. 42, Part 2, No. 1A/B, Jan. 15, 2003, pp. L1-L3.
T. Zheleva et al., “Pendeo-Epitaxy—A New Approach for Lateral Growth of Gallium Nitride Structures”, MRS Internet J. Nitride Semicond. Res. 4S1, G3.38 (1999), 6 pages.
K. Motoki et al., “Preparation of Large Freestanding GaN Substrates by Hydride Vapor Phase Epitaxy Using GaAs as a Starting Substrate”, Jpn. J. Appl. Phys., vol. 40, Part 2, No. 2B, Feb. 15, 2001, pp. L140-L143.
Blum David S.
Foley & Lardner LLP
Hitachi Cable Ltd.
LandOfFree
III-V group nitride system semiconductor substrate does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with III-V group nitride system semiconductor substrate, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and III-V group nitride system semiconductor substrate will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3623905