Active solid-state devices (e.g. – transistors – solid-state diode – Incoherent light emitter structure – Active layer of indirect band gap semiconductor
Patent
1994-09-01
1997-02-25
Crane, Sara W.
Active solid-state devices (e.g., transistors, solid-state diode
Incoherent light emitter structure
Active layer of indirect band gap semiconductor
257 94, 257 96, 257103, 257190, 257201, 257615, H01L 2715, H01L 3112, H01L 3300
Patent
active
056061803
ABSTRACT:
The invention includes a Group III-V compound semiconductor that comprises (1) a thin crystal film of A.sub.1.sup.III As.sub.w P.sub.1-w, wherein A.sub.1.sup.III represents a Group III element with Al composition of less than 0.3, 0.5<w.ltoreq.1, formed on a semiconductor crystal substrate or on an epitaxial film grown on the substrate, a thin crystal film of B.sup.III As, wherein B.sup.III represents a Group III element with Al composition of not less than 0.45, formed on the A.sub.1.sup.III As.sub.w P.sub.1-w film, and a thin film of C.sub.1.sup.III As.sub.x P.sub.1-x, wherein C.sub.1.sup.III represents a Group III element with Al composition of less than 0.3, 0.ltoreq.x 0.5, formed on the B.sup.III As film; or (2) a thin film of A.sub.2.sup.III As.sub.u P.sub.1-u, wherein A.sub.2.sup.III represents a Group III element with In composition of not less than 0.3, 0.ltoreq.u.ltoreq.1, formed on a semiconductor crystal substrate or on an epitaxial film grown on the substrate, a thin crystal film of B.sup.III As, wherein B.sup.III represents a Group III element with Al composition of not less than 0.45, formed on the A.sub.2.sup.III As.sub.u P.sub.1-u film, and a thin film of C.sub.2.sup.III As.sub.z P.sub.1-z, wherein C.sub.2.sup.III represents a Group III element, 0.ltoreq.z.ltoreq.1, formed on the B.sup.III As film.
REFERENCES:
patent: 5016252 (1991-05-01), Hamada et al.
patent: 5103270 (1992-04-01), Sato et al.
patent: 5121183 (1992-06-01), Ogasawara et al.
patent: 5235194 (1993-08-01), Izumiya et al.
patent: 5287377 (1994-02-01), Fukuzawa et al.
patent: 5352909 (1994-10-01), Hori
Goto Hideki
Hosoi Nobuyuki
Shimoyama Kenji
Conlin David G.
Corless Peter F.
Crane Sara W.
Mitsubishi Chemical Corporation
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