III-nitride light emitting device including porous...

Active solid-state devices (e.g. – transistors – solid-state diode – Incoherent light emitter structure

Reexamination Certificate

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C257S094000, C257S096000, C257S097000, C257S103000, C257SE33025, C257SE33026, C257SE33027, C257SE33028, C257SE33029, C257SE33030, C257SE33031, C257SE33032, C257SE33033, C257SE33034, C257SE21115, C257SE21117, C257SE21118, C257SE21119, C257SE21566, C257S013000

Reexamination Certificate

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07928448

ABSTRACT:
A semiconductor structure comprising a III-nitride light emitting layer disposed between an n-type region and a p-type region is grown over a porous III-nitride region. A III-nitride layer comprising InN is disposed between the light emitting layer and the porous III-nitride region. Since the III-nitride layer comprising InN is grown on the porous region, the III-nitride layer comprising InN may be at least partially relaxed, i.e. the III-nitride layer comprising InN may have an in-plane lattice constant larger than an in-plane lattice constant of a conventional GaN layer grown on sapphire.

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