Cleaning and liquid contact with solids – Processes – Including application of electrical radiant or wave energy...
Reexamination Certificate
2006-03-28
2009-08-11
Philogene, Haissa (Department: 2821)
Cleaning and liquid contact with solids
Processes
Including application of electrical radiant or wave energy...
C134S001300, C134S018000, C156S345350, C315S111210, C315S111410, C438S017000
Reexamination Certificate
active
07571732
ABSTRACT:
A method of maintaining a remote plasma unit for cleaning a semiconductor-processing apparatus includes: (i) detecting if the semiconductor-processing apparatus is in an idle state; (ii) if the idle state is detected, igniting the remote plasma unit for cleaning the semiconductor-processing apparatus after a lapse of a given time period; (iii) detecting if the remote plasma unit is ignited in step (ii); and (iv) if the remote plasma unit is not ignited in step (ii), retrying ignition of the remote plasma unit.
REFERENCES:
patent: 7072028 (2006-07-01), Powell et al.
patent: 2006/0228473 (2006-10-01), Satoh et al.
patent: 2008/0251104 (2008-10-01), Chen et al.
Noguchi Satoru
Takizawa Masahiro
Wada Takashi
ASM Japan K.K.
Knobbe Martens Olson & Bear LLP
Philogene Haissa
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