Identifying and compensating for slip-plane dislocations in phot

Details Identifying and compensating for slip-plane dislocations in phot Identifying and compensating for slip-plane dislocations in phot

1993-06-15

1994-09-06

Evans, F. L.

Optics: measuring and testing

By alignment in lateral direction

With registration indicia

356 31, 2504911, 148DIG102, G01B 1126

Patent

active

053453107

ABSTRACT:
Techniques for identifying and determining the orientation, magnitude, and direction of slip plane dislocations transecting semiconductor dies are described, whereby a four point alignment pattern is examined for "squareness" and size integrity. Lack of squareness or significant change in apparent size of various aspects of the alignment pattern indicate slip-plane dislocations. The magnitude, orientation and direction of the dislocations are determined geometrically from measurement of the alignment pattern. Various other aspects of the invention are directed to optimal alignment of a photolithographic mask to a die which has experienced a slip-plane dislocation, and to discrimination between slip-plane dislocation and die-site rotation.

REFERENCES:
patent: 4652134 (1987-03-01), Pasch et al.
patent: 4853549 (1989-08-01), Yanagisawa et al.

Affiliated with

Also associated with

Rating

Identifying and compensating for slip-plane dislocations in phot does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Identifying and compensating for slip-plane dislocations in phot, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Identifying and compensating for slip-plane dislocations in phot will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1333053