ICP-OES and ICP-MS induction current

Optics: measuring and testing – By dispersed light spectroscopy – With sample excitation

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C250S288000

Reexamination Certificate

active

07106438

ABSTRACT:
In a method of spectroscopically analyzing a sample, a plasma is generated. A magnetic field is generated by a magnetic dipole wherein the plasma is confined within the magnetic field. Sample atoms are introduced into the plasma wherein energized atoms of the sample are confined. The spectral composition or mass-to-charge ratio of the energized sample atoms is analyzed. In a spectroscopic system a magnetic dipole has an associated magnetic field. A plasma is confined within the magnetic field and a sample of energized atoms introduced into the plasma. A spectrometer analyzes the energized atoms for the mass-to-charge ratio or for their spectral composition.

REFERENCES:
patent: 4540884 (1985-09-01), Stafford et al.
patent: 4629940 (1986-12-01), Gagne et al.
patent: 4766287 (1988-08-01), Morrisroe et al.
patent: 4818916 (1989-04-01), Morrisroe
patent: 5526110 (1996-06-01), Braymen
patent: 5534998 (1996-07-01), Eastgate et al.
patent: 5648701 (1997-07-01), Hooke et al.
patent: 5818581 (1998-10-01), Kurosawa et al.
patent: 6329757 (2001-12-01), Morrisroe et al.
Rod W. Boswell et al. “Helicons-The Early Years” Dec. 6, 1997, pp. 1229-1245.
Examiner's first report, Australian. Apr. 11, 2006.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

ICP-OES and ICP-MS induction current does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with ICP-OES and ICP-MS induction current, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and ICP-OES and ICP-MS induction current will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3566689

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.