IC comprising functional blocks for which a mask pattern is patt

Details IC comprising functional blocks for which a mask pattern is patt IC comprising functional blocks for which a mask pattern is patt

1994-03-09

1996-11-19

Teska, Kevin J.

Boots, shoes, and leggings

364488490/, G06F 1710

Patent

active

055769691

ABSTRACT:
For functional blocks of an IC, each functional block comprising a plurality of macroblocks, each macroblock comprising a plurality of basic cells, a mask pattern is patterned in accordance with a layout design by using its connection data of the macroblocks in each functional block and its placement data of the basic cells in each functional block. Use of the placement data in addition to the connection data makes it possible to regularly and systematically arrange the basic cells in each functional block to achieve shortest possible connections in each fundamental block and a narrowest possible area of each functional block. In order to put a CPU in operation of patterning the mask pattern, an operating system comprises for read by the CPU first and second memories loaded with the connection and the placement data, respectively.

REFERENCES:
patent: 4093990 (1978-06-01), Koller et al.
patent: 4613941 (1986-09-01), Smith et al.
patent: 4636965 (1987-01-01), Smith et al.
patent: 4811237 (1989-03-01), Putatunda et al.
patent: 4839821 (1989-06-01), Murakata
patent: 4890238 (1989-12-01), Klein et al.
patent: 4910574 (1990-03-01), Aipperspach et al.
patent: 4918614 (1990-04-01), Modarres
patent: 5084824 (1992-01-01), Lam et al.
patent: 5173864 (1992-12-01), Watanabe et al.
patent: 5191542 (1993-03-01), Murofushi
patent: 5247456 (1993-09-01), Ohe et al.
patent: 5311443 (1994-08-01), Crain et al.
patent: 5313079 (1994-05-01), Brasen et al.
patent: 5363313 (1994-11-01), Lee
patent: 5388054 (1995-02-01), Tokumaru
patent: 5422317 (1995-06-01), Hua et al.
"LSI Handobukku " (LSI Handbook), Item 3.2 Reiauto Sekkei (Layout Design), Edited by the Institute of Electronics and Electric Communication Engineers of Japan, Published 1959 by Oomu-Sya, Japan, pp. 201-210.

Affiliated with

Also associated with

Rating

IC comprising functional blocks for which a mask pattern is patt does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with IC comprising functional blocks for which a mask pattern is patt, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and IC comprising functional blocks for which a mask pattern is patt will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-545916