I-line radiation-sensitive alkali-soluble resin composition util

Details I-line radiation-sensitive alkali-soluble resin composition util I-line radiation-sensitive alkali-soluble resin composition util

1990-11-13

1992-05-05

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430165, 430190, 430192, 430193, 430512, G03F 7023, G03C 161

Patent

active

051107066

ABSTRACT:
A radiation-sensitive resin composition comprises (a) an alkali-soluble resin, (b) a 1,2-quinone diazide compound, and (c) an aromatic compound having a specified molecular structure, as essential constituents. The composition is extremely useful for forming a positive type photoresist on a substrate having a high reflectance.

REFERENCES:
patent: 3595656 (1971-07-01), Ruckert et al.

Affiliated with

Also associated with

Rating

I-line radiation-sensitive alkali-soluble resin composition util does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with I-line radiation-sensitive alkali-soluble resin composition util, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and I-line radiation-sensitive alkali-soluble resin composition util will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1411791