Patent
1987-06-01
1991-03-05
Hille, Rolf
357 65, H01L 29460, H01L 29540, H01L 29620
Patent
active
049981587
ABSTRACT:
A hypoeutectic ohmic contact to gallium arsenide comprising a refractory metal layer is provided which reduces the outdiffusion of gallium and arsenic which would otherwise be seen as impurities at the outer surface of the ohmic contact.
REFERENCES:
patent: 3028663 (1962-04-01), Iwersen et al.
patent: 3273979 (1966-09-01), Budnick
patent: 3370207 (1968-02-01), Fabel et al.
patent: 4188710 (1980-02-01), Davey et al.
patent: 4300149 (1981-11-01), Howard et al.
J. K. Howard; Electromigration Improvement of Al--Cu or Au Conductors; IBM Technical Disclosure Bulletin, vol. 21, No. 12, May 1979.
Johnson Karl J.
Weitzel Charles E.
Barbee Joe E.
Brown Peter Toby
Hille Rolf
Motorola Inc.
LandOfFree
Hypoeutectic ohmic contact to N-type gallium arsenide with diffu does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Hypoeutectic ohmic contact to N-type gallium arsenide with diffu, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Hypoeutectic ohmic contact to N-type gallium arsenide with diffu will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-500707