Hyperthermal neutral beam source and method of operating

Details Hyperthermal neutral beam source and method of operating Hyperthermal neutral beam source and method of operating

2008-02-18

2009-12-29

Vanore, David A (Department: 2881)

Radiant energy

Electrically neutral molecular or atomic beam devices and...

C250S492100, C315S111810, C315S500000, C118S7230IR, C118S7230IR, C118S7230ER, C118S7230ER

Reexamination Certificate

active

07638759

ABSTRACT:
Method and system for pumping a hyperthermal neutral beam source is described. The pumping system enables use of the hyperthermal neutral beam source for semiconductor processing applications, such as etching processes. An embodiment is described having a neutral beam source coupled to a processing chamber through a neutralizing grid. Control is provided by separately pumping the neutral beam source and the processing chamber.

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