Hyperthermal neutral beam source and method of operating

Details Hyperthermal neutral beam source and method of operating Hyperthermal neutral beam source and method of operating

2008-04-15

2008-04-15

Kim, Robert (Department: 2881)

Radiant energy

Electrically neutral molecular or atomic beam devices and...

Reexamination Certificate

active

07358484

ABSTRACT:
Method and system for pumping a hyperthermal neutral beam source is described. The pumping system enables use of the hyperthermal neutral beam source for semiconductor processing applications, such as etching processes. An embodiment is described having a neutral beam source coupled to a processing chamber through a neutralizing grid. Control is provided by separately pumping the neutral beam source and the processing chamber.

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