Hydroxylated aromatic polyamide polymer containing bound naphtho

Details Hydroxylated aromatic polyamide polymer containing bound naphtho Hydroxylated aromatic polyamide polymer containing bound naphtho

1989-06-08

1991-08-06

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430192, 430168, 430326, 430330, G03C 152, G03C 500

Patent

active

050377205

ABSTRACT:
A photosensitive alkali-soluble, thermally-stable fluorinated hydroxy-resinous polyamide or polyimide composition comprising a resin-bound diazo sensitizer incorporated by the reaction of an o-quinone diazide sulfonyl chloride sensitizer compound with a predetermined percentage of the hydroxy groups of the hydroxy-resin binder material. The present compositions are self-sensitized, have adjustable alkali-solubility and provide high speed photoresist compositions for producing relief patterns having good edge definition and high thermal stability.

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patent: 4339521 (1982-07-01), Ahne et al.
patent: 4395482 (1983-07-01), Ahne et al.
patent: 4529682 (1985-07-01), Toukhy
patent: 4849051 (1989-07-01), Ahne et al.
patent: 4880722 (1989-11-01), Moreau
patent: 4927736 (1990-05-01), Mueller et al.
English language Abstract of European Publication #264,678, published 4/27/88 (Mueller et al.).

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