Chemistry of inorganic compounds – Nitrogen or compound thereof – Oxygen containing
Patent
1994-05-19
1996-04-23
Langel, Wayne
Chemistry of inorganic compounds
Nitrogen or compound thereof
Oxygen containing
203 49, 203 92, C01B 2120
Patent
active
055100970
ABSTRACT:
The present invention relates to a multi-step process for producing HAN that is free of ammonium nitrate. The process comprises the steps of: (a) stripping ammonia from an ammonia-containing, aqueous hydroxylamine solution having a hydroxylamine concentration of at least 10% by weight based upon the weight of the hydroxylamine solution, by contacting the ammonia-containing hydroxylamine solution with a stripping agent selected from the group consisting of inert gases and steam to provide an ammonia-free, aqueous hydroxylamine solution, and (b) reacting the ammonia-free, aqueous hydroxylamine solution with aqueous nitric acid having an acid concentration of at least about 0.1%, preferably at least about 20%, based upon the weight of the aqueous nitric acid, to produce ammonium nitrate-free HAN. In another process embodiment of the invention, the above-described ammonia stripping step is not required, and the hydroxylamine concentration is at least about 0.5%, based upon the weight of the reaction mixture employed. Also disclosed is the ammonium nitrate-free HAN product produced by the process of this invention.
REFERENCES:
patent: 4260462 (1981-04-01), Didycz et al.
patent: 4956168 (1990-09-01), Wagaman
patent: 5213784 (1993-05-01), Cawlfield
patent: 5266290 (1993-11-01), Levinthal et al.
Brooker Robert T.
Cawlfield David W.
Dotson Ronald L.
Loftis Harry J.
Moore Sanders H.
Carlson Dale L.
Langel Wayne
Olin Corporation
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