Hydrolysis-induced vapor deposition of oxide films

Details Hydrolysis-induced vapor deposition of oxide films Hydrolysis-induced vapor deposition of oxide films

1987-11-13

1989-12-19

Bell, Janyce

Coating processes

Electrical product produced

Welding electrode

4271263, 4271264, 4271265, 427256, 427261, 427262, 427301, 427322, 4271192, B05D 306, B05D 512

Patent

active

048882038

ABSTRACT:
Thin films (e.g. less than 100 nm thick) of a metal oxide material can be deposited on a variety of hydrophilic substrates by hydrolysis. Deposition is achieved by reacting a vapor of an appropriate metal-containing compound with water at or near the substrate's surface. The resulting deposited film can serve a variety of uses, for example, as a photo-resist in micro-electronics or in any area where protective films are useful, such as the passivation of ternary metal oxide superconductors.

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