1988-10-14
1989-06-13
Edlow, Martin H.
357 30, H01L 4580
Patent
active
048397016
ABSTRACT:
A process for production of a hydrogenated amorphous silicon film of a silicon compound containing at least one element selected from the group consisting of hydrogen and halogens and having a photosensitivity of not less than 0.1 erg/cm.sup.2 at 780 nm, which comprises
REFERENCES:
patent: 4409605 (1983-10-01), Ovshinsky
patent: 4620085 (1986-10-01), Wenterling
Imagawa Osamu
Iwanishi Masazumi
Yokoyama Seiichiro
Edlow Martin H.
Toyo Boseki Kabushiki Kaisha
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