Hydrogen sulfide gas sensor and precursor compounds for manufact

Organic compounds -- part of the class 532-570 series – Organic compounds – Heavy metal containing

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556 61, C07F 1100

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053211464

ABSTRACT:
Tungsten carboxylate compounds useful for coating interdigitated electrodes used in hydrogen sulfide gas sensors are disclosed. A method of coating electrodes with the compounds using a precise solution casting technique such as spin-coating or casting, dip-casting or spray-casting techniques is also described. Electrodes which are solution coated with the compounds may be used to fabricate superior quality chemiresistor sensors for use in hydrogen sulfide gas sensing devices by heating the carboxylates above 350.degree. C. to decompose certain carboxylates to WO.sub.3 and others to sodium tungstate.

REFERENCES:
patent: 4197089 (1980-04-01), Willis et al.
patent: 4432224 (1984-02-01), Typpo
patent: 4822465 (1989-04-01), Jones et al.
Chishlonn et al., Polyhedron, 5(8), 1377-80, 1986.
Holste, Z. Anorg. Allg. Chem. 398,249-256, 1973.
Applied Physics Letters, vol. 11, No. 8, "Activated Tungsten Oxide Gas Detectors", 1967.
Department of Chemistry, Brunel University, Uxbridge, Middlesex UB8 3PH (U.K.) "The Mechanism of Operation of Wo.sub.3 -based H.sub.2 S Sensors", 1990.
Prasad et al., "Reactions of Tungsten (VI) Oxytetrachloride with Organic Acids" Journ. Indian. Chem. Soc. 38 pages 763-764, (1961).
Z. Anorg. Allg. Chem. 398, 249-256 (1973).

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