Gas separation: apparatus – Apparatus for selective diffusion of gases – Plural layers
Reexamination Certificate
2011-06-14
2011-06-14
Greene, Jason M (Department: 1775)
Gas separation: apparatus
Apparatus for selective diffusion of gases
Plural layers
C096S007000, C095S055000, C095S056000, C429S411000, C502S004000, C264S044000, C264S666000, C264S674000, C264S676000, C264S681000
Reexamination Certificate
active
07959716
ABSTRACT:
A hydrogen permeable membrane is disclosed. The membrane is prepared by forming a mixture of metal oxide powder and ceramic oxide powder and a pore former into an article. The article is dried at elevated temperatures and then sintered in a reducing atmosphere to provide a dense hydrogen permeable portion near the surface of the sintered mixture. The dense hydrogen permeable portion has a higher initial concentration of metal than the remainder of the sintered mixture and is present in the range of from about 20 to about 80 percent by volume of the dense hydrogen permeable portion.
REFERENCES:
patent: 3413777 (1968-12-01), Langley et al.
patent: 5534471 (1996-07-01), Carolan et al.
patent: 6214757 (2001-04-01), Schwartz et al.
patent: 6569226 (2003-05-01), Dorris et al.
patent: 7393384 (2008-07-01), Gopalan et al.
patent: 7396384 (2008-07-01), Barker et al.
patent: 2003/0183080 (2003-10-01), Mundschau
patent: 2004/0129135 (2004-07-01), Roark et al.
patent: 2005/0222479 (2005-10-01), Balachandran
patent: 2008/0282882 (2008-11-01), Saukaitis et al.
Balachandran Uthamalingam
Chen Ling
Dorris Stephen E.
Lee Tae H.
Song Sun-Ju
Greene Jason M
Olson & Cepuritis, Ltd.
UChicago Argonne LLC
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